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High Electrical Reliability Halogen-free Solder Paste
- S3X58-HF900N
S3X58-HF900N is engineered to ensure extremely high reliability in SIR/ECM with an ultra-narrow pattern (0.125 mm) by adopting an optimized activator formulation combined with a hydrophobic rosin system, which prevents the generation of metal ions
feature
- Insure extremely high electrical reliability with an ultra narrow pattern
- Designed for N2 reflow
- Halogen free, no artificial addition of any halogen element
Product Performance Table
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Product name
S3X58-HF900N
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Composition
Sn 3.0Ag 0.5Cu
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Melting Point(℃)
217 - 219
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Particle Size(μm)
20 - 38
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Flux Content(%)
11.0
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Viscosity(Pa.s)
220
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Halide content(%)
0
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Flux Type
ROL0 (IPC J-STD-004B)
Reliability Challenges in Narrow Gap Patterns
When testing insulation reliability and flux residues, a 0.317mm gap comb coupon is normally used for both JIS and IPC standards. However, more and more customers are recently requesting a narrower gap test coupon.
■Issues
・Narrower gap allows metal ions to move between electrodes and increase electro migration.
・The above allows easier movement of ionized metal between tracks, thus increasing the occurence of electro migration.
■Solution
・The activator reducing system and hydrophobic rosin system in S3X58-HF900N prevents the formation of ionic metal.
This helps stop the occurrence of electro migration in very narrow tracks.
New Technology Achieves High SIR
■Conventional
Lowered insulation resistance due to the existence of ionic substances in the flux residue accelerates activity of the ionic substances.
Discharged metallic ion at the anode transfers to the cathode and gets reduced to a metal. The metallic deposit accumulates to form a dendrite at the cathode and shortens the distance between the electrode, resulting in ionic migration.
■S3X58-900N
With HF900N, less ionic substances remain in the flux residue. Due to the absence of ionic substances in the flux residue,
insulation resistance stays consistent even when a voltage is applied.
Notable Result in Narrow Gap SIR Test
S3X58-HF900N retains high SIR with no ionic migration observed after a 1000 hour applied voltage environment test.
Very Low Metallic Ions in Flux Residue
Flux residue contains very low metallic ions, which contributes to high SIR.
Contact Us Inquiry
For any requests for estimates, product information, technical questions, etc. please reach out to us.